M.A.R.K. 13 working very hard - for 1 second!

Increasing global digitalization means increasing requirements for computer performance - chips have to be smaller and more efficient. With EUV lithography, TRUMPF, in partnership with ASML and Zeiss, has developed a cost-efficient and mass-suitable process, during which the wafers are exposed to extreme ultraviolet (EUV) light at a wavelength of 13,5 nanometers. See what all happens in one second here.

Mark13_Trumpf.png